AtomicLayerDeposition相关论文
Multilayer Strategy for Photoelectrochemical Hydrogen Generation:New Electrode Architecture that All
Years of research have demon-strated that the use of multiple components is essential to the develop-ment of a commercia......
Atomic layer deposition (ALD) as a flexible surface-controlled fabrication technique has attracted widespread interest i......
Understanding carbon-supported Pt-catalyzed oxygen reduction reaction (ORR) from the perspective of the active sites is ......
Assembly of nanoparticles into nanochains can produce novels physic properties compared with separated particles.It is n......
Band Alignment of Atomic Layer Deposited Al2O3/Zn0.8Al0.2Oy Hetero-interface Determined by X-ray Pho
Al2O3 and ZnO/Al2O3 are prepared on silicon substrates via atomic layer deposition (ALD). Diethyl zinc (DEZ), trimethly ......
Highly efficient and low-cost spongies modified by atomic layer deposition of oxides and silane coup
To clean up oil spills and remove organic pollutants from water,porous absorbents with a strong hydrophobicity,either na......
Interactions between dimethylaluminum isopropoxide molecules and their effect on dimethylaluminum is
An alumina thin-film has recently been actively studied in solar cell sector to utilize its negative fixed charge to sup......
Plasma-enhanced atomic layer deposition of Al2O3/TiO2 moisture permeation barriers on polymer substr
Flexible plastic substrates are widely used nowadays in many industries including automotive applications,electrical app......
We report the structural,electrical,and optical characteristics of Al-doped ZnO (ZnO∶Al) films deposited on glass by at......
Improved Al2O3 Dielectric Properties using Remote Plasma Atomic Layer Deposition with Negative-Biase
Atomic layer deposition (ALD) has been a industry-standard deposition method because it can provide precise thickness co......
Comparative Study of Plasma-Enhanced Atomic Layer Deposition Ni by using Two Metallorganic Precursor
Nickel thin films were deposited by plasma-enhanced atomic layer deposition (PE-ALD) by using metallorganic precursors a......
Plasma Activation of Porous Polytetrafluoroethylene Membranes for Superior Hydrophilicity and Separa
Conformal and smooth TiO2 thin layers were coated on the surface of porous PTFE membranes subjected to a plasma activati......
Atomic layer deposition of Al2O3 and TiO2 ultrathin coatings on NiO/nickel foam for high performance
In recent years,supercapacitors have received considerable attention as attractive electrochemical energy-storage and co......
Influence of low pressure Argon plasma on the deposition of Al2O3 film onto the PET surfaces by atom
Here the surface modifications of polyethyleneterephthalate(PET)films are carried out by the atomic layer deposition(ALD......
The influences of processing parameters on properties of Alumina films deposited by ECR plasma-assis
Without extra-heating,Al2O3 films were prepared by atomic layer deposition(ALD)process through a home-made ECR setup.The......
Atomic layer deposition(ALD)was used to controllably deliver precursors of TiO2 into the cores of micellar films of the ......
Rationally Designed Anatase-Rutile TiO2 Phase Junctions for Improved Photoelectrochemical Water Spli
In a photoelectrochemical cell for water splitting,the critical issue is charge separation and transport,which is usuall......
Copper thin films were deposited on inner wall of rectangular carbon fibre reinforced plastic(CFRP) waveguide with high ......
Recently,atomic layer deposition(ALD)has been adopted in the surface modifications of nanoparticles with controllable de......
Two-dimensional TiO2 nanosheets(thickness of~11 up to~80 nm)were successfully synthesized by atomic layer deposition(ALD......
Investigation of Electron Cyclotron Resonance Plasma-assisted Atomic Layer Deposition Al2O3 Thin Fil
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Atomic layer deposition (ALD) has recently been widely studied for the precisely controlling of thickness and uniformity......
Investigation of electron cyclotron resonance plasma-assisted atomic layer deposition Al2O3 thin fil
Without extra-heating,Al2O3 thin films were deposited on hydrogen-terminated Si substrate etched in hydrofluoric acid by......
The Study of in-Situ Growth Mechanism of Magnetized Plasma-Assisted Atomic Layer Deposition of Al2O3
Growth mechanism during plasma-assisted atomic layer deposition (PA-ALD) of Al2O3 thin film was studied by in-situ spect......
Synthesis of Activated Carbon Supported Palladium Nanoparticle Catalysts Using Atomic Layer Depositi
Uniform and tunable palladium nanoparticle is deposited on activated carbon(AC)supports by atomic layer deposition(ALD)u......
Non-polar,semi-polar,and polar ZnO thin films can be well controlled to epitaxially grow at 200 ℃ on different substrat......
TiO2-Graphene Hybrid Nanostructures by Atomic Layer Deposition with Enhanced Electrochemical Perform
Atomic layer deposition is applied to coat graphene nanosheets with nano-TiO2 (TiO2-Grs).The coatings have a highly cont......
The catalytic performance study of the PdGa/β-Ga2O3 catalysis prepared by atomic layer deposition an
The catalytic performances of PdGa/β-Ga2O3 catalysts prepared by atomic layer deposition(ALD)and impregnation method we......
Atomic Layer Deposition Al2O3@Transition Metal Vanadate/CNTs Composite as Electrodes for Potassium-I
Potassium ion battery(PIBs)has become a new generation of secondary battery in recent years due to its abundant potassiu......
A Theoretical Search for the Dominant Reaction Pathway of HfO2 Films by Atomic Layer Deposition Duri
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采用原子层沉积技术，以Al(CH3)3为铝的前驱体，分别以TiCl4和四(二甲基氨基)钛(TDMAT)为钛的前驱体制备了两种TiAlC薄膜，并对比分析了......
以乙酰丙酮铱[Ir(acac)3]和高纯氧为前驱体，采用原子层沉积(ALD)方法在基板温度为340 ℃的石英玻璃和硅基板上制备了金属铱薄膜。采......
Different laminated structures of ...
The selective deposition of Fe species inside ZSM-5 for the oxidation of cyclohexane to cyclohexanon
The design of efficient iron-based catalysts remains a great challenge for selective cyclohexane oxidation to cyclohexan......
An Effective Way to Simultaneous Realization of Excellent Optical and Electrical Performance in Larg
Despite the optical advantage of near-zero reflection, the silicon nanowire arrays (SiNWs) based solar cells cannot ......
我们描述一个直接原子的层免职方法种润滑剂钨二硫化物(WS <sub>2</sub>) 电影。WS <sub>2</sub> 电影在 Si (100 ) 底层和一部锌......
Developing highly efficient magnetic microwave absorbers (MAs) is crucial, and yet challenging for anti-corrosion proper......
Enhancing both selectivity and coking-resistance of a single-atom Pd1/C3N4 catalyst for acetylene hy
为探究吕家坨井田地质构造格局,根据钻孔勘探资料,采用分形理论和趋势面分析方法,研究了井田7......
Atomic-scale tuned interface of nickel-rich cathode for enhanced electrochemical performance in lith
The Ni-rich layered LiNi0.6Mn0.2Co0.2O2 (NMC622) is one promising cathode for lithium-ion batteries(LIBs),but suffers fr......
Characterization and application in XRF of HfO2-coated glass monocapillary based on atomic layer dep
Coating a glass monocapillary x-ray optics with high-density film is a promising way to improve transmission char-acteri......
我们成功合成了TaN薄膜原子层淀积的高纯有机钽先驱物并使其特性化,同时对这些先驱物的汽压和热稳定性进行了研究.根据汽压分析发......
